ISSN 0862-5468 (Print), ISSN 1804-5847 (online) 

Ceramics-Silikáty 32, (4) 289 - 303 (1988)


THE EFFECT OF FIRING TEMPERATURE ON THE PROPERTIES OF MODEL THICK-FILM RESISTORS

II. Critical Coefficients of the Percolation Theory


 
Kubový Alois
 
Research Institute of Electrotechnical Ceramics, Pospíšilova 281, 500 64 Hradec Králové

Conceptions of the development of structure in thick-film resistors in the course of firing [1] can be verified by measuring the dependence of the critical coefficients of the percolation theory on firing temperature. The deviations of critical coefficients from the theoretical values are theoretically explained by the assumed formation of impurity states in the glass, as a result of diffusion of Ru during the firing. The estimated activation energy of the diffusion should amount to about 1.5 eV.


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