Ceramics-Silikáty 32, (2) 109 - 123 (1988) |
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| THE EFFECT OF FIRING TEMPERATURE ON THE PROPERTIES OF MODEL THICK-FILM RESISTORS
I. Morphology and Microstructure of the Films
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Kubový Alois, Havlas Ivo
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Research Institute of Electrotechnical Ceramics, Pospíšilova 281, 500 64 Hradec Králové
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On the basis of microscopical examinations and resistivity and Seebeck's coefficient measurements, a model of the development of structure (morphology) of thick-film resistors (TFR) during their firing has been suggested. The model differs from those published so far particularly in that formation of a narrow band of localised impurity states, resulting from diffusion of Ru from the conductive grains, is considered instead of sintering of conductive grains in the last stage of structural development. |
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